http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H10172961-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_43ee55d23b83ae77d3b990af9481585e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1996-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78ca48c6d5e1916ac4b0617fa692849d |
| publicationDate | 1998-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H10172961-A |
| titleOfInvention | Focus ring for plasma etching equipment |
| abstract | (57) [Problem] To provide a focus ring for a plasma etching apparatus made of a Si-containing glassy carbon material which is less consumed at the time of etching and has excellent product yield. SOLUTION: Si is contained in a glassy carbon structure by 0.1%. A focus ring for a plasma etching apparatus comprising a Si-containing glassy carbon material dispersed in a range of from 10 to 10% by weight. The wear during plasma etching is small, and stable use over a long period of time is possible. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012253209-A |
| priorityDate | 1996-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 81.