| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D177-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-29 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G69-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D177-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-29 |
| filingDate |
1996-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50c05e1481593cf7a7f31bbf076799e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1512e632b2dd75442d3e4f65473c85eb |
| publicationDate |
1998-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H10171126-A |
| titleOfInvention |
Alkaline aqueous solution and pattern forming method for photosensitive resin composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a method for forming a pattern of a photosensitive resin composition which not only has excellent sensitivity and film reduction rate but also eliminates scum in a pattern processing step and can obtain high resolution. SOLUTION: A positive photosensitive resin composition comprising a polyamide and a diazoquinone compound having a specific structure is applied to a substrate or the like, prebaked, irradiated with light, and then exposed to an alkaline aqueous solution containing an anionic surfactant. A method for forming a pattern of a photosensitive resin composition by dissolving and removing a part to obtain a pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1070991-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6383639-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1070991-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005070763-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100527226-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200038124-A |
| priorityDate |
1996-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |