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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
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filingDate 1996-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64c140bde165dc8298fe42ba69ad5dd6
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publicationDate 1998-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10152376-A
titleOfInvention Electrode plate for plasma etching
abstract (57) [Problem] To provide an electrode plate for plasma etching which has a small number of foreign substances such as carbon particles which drop and adhere to a wafer surface during etching and has a low consumption rate. SOLUTION: An electrode plate for plasma etching made of glassy carbon in which the largest constituent particles at a predetermined location have a particle diameter in a range of 5 to 60 nm.
priorityDate 1996-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.