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filingDate 1996-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1998-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H10102251-A
titleOfInvention Method and apparatus for forming and etching carbon atoms
abstract [PROBLEMS] To form and etch carbon atoms in a reactive plasma or during laser ablation using carbon atoms which can directly and accurately measure carbon radicals with high reproducibility and control the processing process. Provision of a method and an apparatus thereof. A source gas containing at least carbon atoms is turned into plasma. When the carbon atoms of the plasma-converted raw material gas are deposited on the target object to form a film, or when the carbon atoms collide with the target object and are etched, the carbon atom emission lines emitted from the emission line generating means are emitted. The plasma is irradiated, and the carbon atom density in the plasma is measured based on the emission amount of the carbon atom emission line and the plasma transmission amount. Plasma treatment is performed based on the measured carbon atom density.
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