| abstract |
(57) [Summary] (Modified) SOLUTION: A bisphenol carboxylic acid tertiary ester derivative represented by the following general formula (1), and a chemically amplified positive resist composition containing the same as a dissolution inhibitor. (In the formula, R 1 and R 3 are hydrogen atoms, alkyl groups, etc., R 2 is an alkylene group, R 4 is a tertiary alkyl group, and R 5 is —CR 6 It is an acetal substituent represented by R 7 OR 8 . R 6 May contain a carbonyl group in the molecular chain such as a hydrogen atom and an alkyl group. R 7 is an alkyl group or the like, and may have a carbonyl group in the molecular chain. R 8 is an alkyl group or an alkoxyalkyl group, and may have a carbonyl group in the molecular chain. p is an integer of 0 to 5, q is 1 or 2, m and n are integers satisfying m ≧ 0, n ≧ 1, and m + n ≦ 5. [Effect] A resist material containing a dissolution inhibitor composed of a bisphenolcarboxylic acid tertiary ester derivative represented by the above formula (1) can obtain a large dissolution contrast. |