http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008209473-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f110e0e7102931afe7edfc0254e94e54 |
| publicationDate | 2008-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008209473-A |
| titleOfInvention | Positive resist composition and pattern forming method using the same |
| abstract | In microfabrication of a semiconductor device using actinic rays or radiation, particularly KrF excimer laser light, electron beam or EUV light, high sensitivity, high resolution, and good density dependence are satisfied at the same time. Also provided are a positive resist composition having good line width roughness and dissolution contrast, and a pattern forming method using the same. [MEANS FOR SOLVING PROBLEMS] (A) A compound capable of generating an acid upon irradiation with actinic rays or radiation, and (B) a carboxyl group protected by a group capable of leaving by the action of an acid and a group capable of leaving by the action of an acid. A positive resist composition containing a compound having a molecular weight of 500 to 3000 having a phenolic hydroxyl group and a pattern forming method using the same. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022091731-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2022091731-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7151943-B2 |
| priorityDate | 2007-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 199.