| abstract |
(57) Abstract: A semiconductor device used for a liquid crystal display element, a sensor array, a RAM and the like is manufactured at low cost and has high performance and reliability, and a manufacturing apparatus thereof is provided. The amorphous thin film is polycrystallized by laser annealing using holography in vacuum, and then a gate insulating layer and a gate metal are continuously deposited without breaking the vacuum. Alternatively, the deposition and patterning of the amorphous thin film is also performed in vacuum. |