| abstract |
(57) [Abstract] (Correction) [Problem] A microfabrication technique that has high sensitivity to high-energy rays such as deep ultraviolet rays, electron beams, and X-rays, and can form patterns by developing with an alkaline aqueous solution. A suitable chemically amplified positive resist material is obtained. SOLUTION: The organic solvent (A) and the base resin (B) have a weight average molecular weight of 2,0 represented by the following general formula (1). A polymer compound having a weight average molecular weight of 100 to 50,000, (C) an acid generator, and (D) a dissolution controller. More than 0 and 3,000 or less, and the hydrogen atom of the phenolic hydroxyl group of the compound having a phenolic hydroxyl group in the molecule is more than 0% and 60% on average as a whole due to the acid labile group. A chemically amplified positive resist material containing a compound partially substituted in the following proportions. |