| abstract |
(57) [Summary] (Modified) [PROBLEMS] To provide an electrostatic chuck used to hold a substrate in a process chamber. A chuck (20) is suitable for mounting on a base (25) and has at least two electrodes (50a, 50). An electrostatic member 33 having b is provided. Two electrode chucks 2 in combination with a switching system capable of operating in a monopolar or bipolar state position 0 is used. |