| abstract |
(57) [Abstract] (Correction) [Problem] A microfabrication technique that has high sensitivity to high-energy rays such as deep ultraviolet rays, electron beams, and X-rays, and can form patterns by developing with an alkaline aqueous solution. A suitable chemically amplified positive resist material is obtained. SOLUTION: The organic solvent (A) and the base resin (B) are represented by the following general formula (1) and have a weight average molecular weight of 3,0. A polymer compound having a weight average molecular weight of from 100 to 300,000, (C) an acid generator, and (D) a dissolution controller. To 1,000 and a compound having a phenolic hydroxyl group in the molecule, wherein the hydrogen atom of the phenolic hydroxyl group is replaced with an acid labile group at a rate of 10 to 100% on average as a whole. Positive resist material. |