http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09160229-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1995-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68f6fb44fd3dab65dbf5c0d3581f3507 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc370184cf250b420ea0f0a585197f52 |
publicationDate | 1997-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H09160229-A |
titleOfInvention | Radiation-sensitive coating composition and semiconductor manufacturing method |
abstract | (57) Abstract: The present invention provides a radiation-sensitive coating composition capable of easily visually identifying the history of the process for each wafer in a semiconductor manufacturing process such as an etching process and an ion implantation process. And a semiconductor manufacturing method using the composition. In a radiation-sensitive coating composition containing an alkali-soluble resin, a solvent and a radiation-sensitive compound, the composition contains a dye whose color tone changes according to a pH (acid-basic degree) value. A radiation-sensitive coating composition and a semiconductor manufacturing method using the radiation-sensitive coating composition in a semiconductor manufacturing process. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002062667-A |
priorityDate | 1995-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 262.