http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08316205-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
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filingDate 1995-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddc1f58052c1fb98335df3f8ded44e3d
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publicationDate 1996-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H08316205-A
titleOfInvention Plasma processing method and plasma processing apparatus
abstract (57) [Summary] [Structure] In a plasma processing apparatus having an RF coil, an insulating plate (6) is provided at a position where an induced current (7) induced by the RF coils (3), (13) and (14) is blocked. , That is, the split plate is arranged. [Effect] Since the plasma can be kept away from the side wall of the processing chamber, there is an effect that consumption of the side wall of the processing chamber can be reduced and high density plasma can be generated.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6815365-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100322330-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6197120-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003525519-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012031560-A1
priorityDate 1995-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Incoming Links

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Total number of triples: 23.