| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fc0a00eab3a757e8324b1e887d7ba97 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate |
1996-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91132b941031898df3b64b700e14768e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96afd3ae1cdbfebc3150c946983229b2 |
| publicationDate |
1996-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H08306673-A |
| titleOfInvention |
Plasma chemical etching apparatus and method using laser |
| abstract |
Kind Code: A1 Abstract: A plasma chemical etching apparatus and method using a laser capable of obtaining a very thin and uniform semiconductor substrate with high final surface quality. A scannable laser and controller (58) Is used to perform a differential heat treatment on a portion of the semiconductor substrate (40) during downstream etching. Such differential heating provides different etch rates for each heated portion, improving uniformity and reducing surface damage caused by etching. The downstream plasma is accommodated in the substrate (4 0) and the scannable laser part (58), an etching chamber (50) whose direct line of sight can be set is provided. In addition, the system allows dynamic process updates by measuring etch rate and temperature accordingly. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10226852-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017503673-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016514364-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012234667-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10978321-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007517400-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008249537-A |
| priorityDate |
1995-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |