| abstract |
(57) [Summary] [Object] To provide a raw material supply mechanism capable of obtaining a sufficient raw material supply amount even when the temperature of a raw material container is lowered in a CVD method using a liquid or solid metal compound raw material at room temperature and atmospheric pressure. [Structure] Several plates 4 having many holes are installed in a raw material container 1, and Ba (DPM) 2 and Sr (DPM) 2 are placed thereon. A metal compound raw material 3 such as the above is placed, and a carrier gas is supplied from the lower portion of the raw material container 1. Since the effective surface area of the raw material can be increased, the saturated vapor pressure is approached in the steady state. As a result, a sufficient amount of raw material can be supplied even at low temperatures. |