http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08262698-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1995-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_264355354de941b0f6fb7b6e4c489b4a |
| publicationDate | 1996-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08262698-A |
| titleOfInvention | Method of preparing resist solution |
| abstract | (57) [Summary] [Structure] A resist solution obtained by mixing an alkali-soluble resin, a quinonediazide group-containing compound and an organic solvent has an absorbance of 0.0 at a wavelength of 500 nm. It is a method for preparing a resist solution in which the temperature is heated to 75 to 85 ° C. until the temperature falls within the range of 5 to 0.75. [Effects] Generation of fine particles and the like is suppressed even after long-term storage, extremely long-term storage stability is excellent, and a resist solution suitable for use in the production of electronic components requiring high yield can be easily prepared. . |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010204306-A |
| priorityDate | 1995-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 100.