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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
filingDate 2009-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76976ef4f1eb2292145e6a87faa8463d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d00ca0034edd9d41ad3bce89a7f7e989
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e0a67472d9cd3797004071437c37a8b
publicationDate 2010-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2010204306-A
titleOfInvention Method for producing resin solution for photoresist
abstract Provided is a method for producing a photoresist resin solution, which can reduce the thermal history of the photoresist resin and can efficiently and easily produce a photoresist resin solution. The method for producing a photoresist resin solution includes: (1) a resin solution preparation step of preparing a resin solution containing a photoresist resin by polymerizing a polymerizable compound; and (2) a resin. A recovery step of recovering the resin contained in the solution by reprecipitation; (3) a cleaning step of filtering the recovered resin and washing it with a cleaning solvent; A dissolving step for dissolving in the solvent for the solvent, and in the dissolving step, at least one of the wet powder and the solvent for the photoresist is cooled, and then the temperature of the mixture of the wet powder and the solvent for the photoresist is raised. . [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013032508-A
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type http://data.epo.org/linked-data/def/patent/Publication

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