| abstract |
(57) [Summary] (Corrected)n[Configuration] The following general formula (1)n (In the formula, Q is a t-butoxycarbonyl group or the like, and n is 1 to 3 , X and m are x + m = 1, but x becomes 0 And not. ) And the silicone polymer Acid generator that decomposes to generate acid by the action of radiation Positive type developable with an alkaline aqueous solution containing two components A distant material, wherein the acid generator is represented by the general formula (2) (R ) p JM (in the formula, R Is an aromatic group or a substituted aromatic group However, at least one of R is R 1 3 CO- (R 1 Is charcoal Substituted or unsubstituted monovalent hydrocarbon group having a prime number of 1 to 10) A phenyl group substituted with a t-alkoxy group or the like. , J is sulfonium or iodonium, M is p-tolu Ensulfonate group or trifluoromethanesulfone Indicates a nate group. p is 2 or 3. ) It is a nickel salt.n[Effect] Sensitive to high energy rays, excellent in sensitivity and resolution The present positive resist material is provided. |