http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H08119793-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5276cc55b3afbd44d7527f4ccaad1c18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3cd2b27efa87484ce8b01a1cb58ed003 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate | 1994-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00dfb1e7ac910b1a38df7fb8fa6303e7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69c37289a195b653c45ab4a0f5a98d75 |
| publicationDate | 1996-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H08119793-A |
| titleOfInvention | Crystalline thin film forming apparatus, crystalline thin film forming method, plasma irradiation apparatus, and plasma irradiation method |
| abstract | (57) [Summary] [Purpose] To eliminate the effect of the plasma sheath. [Structure] The plasma generated by the ECR ion source 2 is accelerated to the irradiation target by the gradient of the diverging magnetic field lines B ECR . In this case, electrons in the plasma is moved along the magnetic field lines B ECR with spiral motion around the magnetic field lines B ECR. A conductive sheath remover 18a having an opening is inserted in the plasma path. Therefore, electrons having a Larmor diameter D L larger than the minimum opening diameter D S and a Debye length L D larger than the opening depth T S are blocked by the sheath remover 18a. Based on the Larmor diameter D L and the Debye length L D that substantially contribute to the generation of the plasma sheath, the minimum aperture diameter D By setting S and the opening depth T S , the generation of the plasma sheath is substantially eliminated downstream of the sheath remover 18a. [Effect] The generation of the plasma sheath is suppressed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111717883-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6362097-B1 |
| priorityDate | 1994-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.