http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0786239-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203 |
| filingDate | 1993-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_718c47a467ef7a1ee0c5ec5b71d370c4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e3947a4392ce57af2f2946179dc3577 |
| publicationDate | 1995-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0786239-A |
| titleOfInvention | Plasma processing device |
| abstract | (57) [Summary] [Object] To provide a plasma processing apparatus capable of preventing damage to a substrate to be processed due to generation of high-density plasma. A surface treatment chamber 1 for performing a surface treatment, an electromagnetic wave supply means for applying an electromagnetic wave to the surface treatment chamber 1, which includes an RF power source 6, a matching unit 7 and an antenna 4, and a surface treatment chamber 1. It is composed of an electromagnet 5 for giving a static magnetic field and a conductor resonator 11 provided in the surface treatment chamber 1 for resonating a helicon wave. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001348274-A |
| priorityDate | 1993-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 |
Total number of triples: 16.