| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
1993-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8bcac28d9cf576ebeefd3381d49bb9f |
| publicationDate |
1995-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0745595-A |
| titleOfInvention |
Patterning method for semiconductor device |
| abstract |
(57) [Summary] [Object] To provide a patterning method of a semiconductor device capable of performing accurate patterning by a simpler process. [Structure] A Cr material layer 2 is formed on a glass substrate 1, and patterning is performed to use this Cr material layer 2 as a wiring layer. A Kafman type ion gun 40 irradiates the material layer 2 with a parallel ion flow of fluorine ions F + through the mask plate 3 having an opening window having a shape corresponding to the pattern of the wiring layer to be formed. On the surface of the material layer 2, Ions collide with a region corresponding to the pattern of the mask plate 3, so that a fluorine compound film is formed in this region. By etching the Cr and the fluorine compound film at different etching rates, a desired wiring layer is patterned. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012048030-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113217316-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100977982-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001056544-A |
| priorityDate |
1993-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |