http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0745587-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0a6a69da5879eb83f56f6876dba3e3cf |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 1993-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88d1cc4e93cb460978aa6c1258be9b22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de98abcbdc19fda01fd156ecb44c405c |
| publicationDate | 1995-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0745587-A |
| titleOfInvention | Method for manufacturing semiconductor device |
| abstract | (57) [Abstract] [Purpose] In the dry etching process of an insulating film on an aluminum wiring, aluminum fluoride and Teflon-based deposits are prevented from being generated, and contact defects are reduced. [Structure] After a silicon oxide film 4 deposited on an aluminum wiring 3 of a silicon substrate 1 is dry-etched with a fluorine-based gas, plasma using oxygen is irradiated to remove the Teflon-based deposit 6. Next, while heating the silicon substrate 1, over etching is performed with a bromine-based gas or a chlorine-based gas to prevent aluminum fluoride from being produced as a deposit. Finally, a plasma using nitrogen is irradiated to remove residual bromine atoms and chlorine atoms that cause aluminum corrosion. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100450564-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100414300-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100453956-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7033954-B2 |
| priorityDate | 1993-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.