| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-44 |
| filingDate |
1995-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bcd316783284e03bc8c0e571509038d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83245128efb46a53e8bed37dd41bd37c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d4216a8da0c3cf2a584eaf79a319d9d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a211baaac804b7c6642b1a75fa9ac4d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9cc1a50c2c2757c8e2fcc8f0cbeed5 |
| publicationDate |
1995-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H07297177-A |
| titleOfInvention |
Plasma processing method |
| abstract |
(57) [Abstract] [Purpose] Even a sample having an insulating material is etched with a fine pattern and a high aspect ratio without accumulating charges in the sample. The etching processing gas having a component that reacts with the material to be etched and a component that forms a deposited film and has a critical potential is turned into plasma under reduced pressure, and a high frequency voltage having a frequency of 2 MHz or less is applied to an electrode on which the material to be etched is arranged. The applied voltage is changed to change the output voltage of the high frequency voltage across the critical potential, and etching and film formation are alternately repeated on the material to be etched. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6417013-B1 |
| priorityDate |
1995-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |