http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07283207-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 1995-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9cc1a50c2c2757c8e2fcc8f0cbeed5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d4216a8da0c3cf2a584eaf79a319d9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a211baaac804b7c6642b1a75fa9ac4d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bcd316783284e03bc8c0e571509038d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83245128efb46a53e8bed37dd41bd37c |
| publicationDate | 1995-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07283207-A |
| titleOfInvention | Plasma processing method |
| abstract | (57) [Abstract] [Purpose] The material to be etched is substantially anisotropically etched. [Structure] An etching gas having a component that reacts with a material to be etched and a component that forms a deposited film and has a critical potential is turned into plasma under reduced pressure, and an acceleration voltage that accelerates ions in the plasma toward the material to be etched is applied. It has a step of alternately changing the critical potential and alternately repeating etching and film formation with respect to the material to be etched, and the action time of the etching is the time when the undercut occurring in the material to be etched falls within the allowable value, The working time of the film formation is a time for forming a film thickness such that the film formed on the etching side surface during the next etching process can remain as a protective film. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100356470-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001168081-A |
| priorityDate | 1995-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.