http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07273037-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d6402b23ab8782152be47b3996e48a4a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 1994-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c608e499a89f52e33851bf2126a340 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4618062037a93addb147dad6c2dc4ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3397add133583a85ba6fb6d88311f82 |
| publicationDate | 1995-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07273037-A |
| titleOfInvention | Semiconductor substrate processing equipment |
| abstract | (57) [Summary] [Object] To provide a semiconductor substrate processing apparatus using a CVD method. [Structure] Substrate heating table 2 that holds and heats wafer 20 And a multi-electrode 5 in which a plurality of excitation-side electrode plates that are excited by a high frequency that excites the gas to be activated in a plasma state and ground-side electrode plates that are grounded are alternately arranged, and an activated plasma state Plasma-like gas disperser 11 for uniformly supplying gas to the surface of wafer 20, ring-shaped nozzles 8a and 8b for supplying reaction gas for forming a film on the surface of wafer 20, and the reaction gas and plasma-like gas are uniformly mixed. Then wafer 20 By forming the reaction chamber 4a supplied to the surface and the exhaust port 12 provided around the wafer 20 whose exhaust amount can be adjusted, metal nitride, silicide, or metal oxide film can be formed on a large-diameter wafer. It becomes possible to carry out uniformly at low temperature. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020074409-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09283450-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021101479-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11469081-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6382129-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11469083-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11749510-B2 |
| priorityDate | 1994-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.