| abstract |
(57) [Summary] [Structure] In the plasma processing apparatus, the central axis of the coil 3 is processed by the side wall 2 made of a dielectric material such as quartz or alumina ceramics in the processing chamber. Arrange a plurality so as to face the inside of the chamber 1, The coil 3 is configured to be supplied with high frequency power. [Effect] Since the disappearance of plasma on the side wall of the processing chamber can be suppressed, there is an effect that more uniform plasma can be generated. |