http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07261386-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
| filingDate | 1995-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65e3ab5c20c234fbaa1d3b322a271f29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c555b4775438c7f68d1989c240e895d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a62fb2b1cccf7e184657a396a0921dc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76e23e115d68f019f7acafda6ee18fd0 |
| publicationDate | 1995-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07261386-A |
| titleOfInvention | Photosensitive resin composition, method for producing photosensitive element and plating resist using the same |
| abstract | (57) [Summary] (Modified) [Objective] A photosensitive resin composition suitable as a photoresist for electroless copper plating, a photosensitive element comprising a layer of the composition and a support film supporting the layer, and Manufacturing method of plating resist. [Structure] (A) General formula (I) [Wherein, R 1 is a divalent saturated aliphatic hydrocarbon group, R 2 and R 2 3 is an alkyl group having 1 to 4 carbon atoms, x and y are 0 A compound having one ethylenically unsaturated group and one isocyanate group with respect to the hydroxyl group in the polyhydroxy ether resin having a repeating unit represented by the formula [4], and a saturated or unsaturated polybasic acid anhydride To obtain a carboxyl group-containing unsaturated polyhydroxy ether resin compound, (B) a photopolymerizable unsaturated compound containing at least one ethylenically unsaturated group at the end, and (C) free radicals by active light. A photosensitive resin composition containing a photoinitiator produced, a method for producing a photosensitive element and a plating resist using the same. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5058973-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8206828-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007108351-A1 |
| priorityDate | 1994-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 155.