http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07234200-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-30 |
| filingDate | 1994-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1029b7e282c31d171bc512169ad7f64d |
| publicationDate | 1995-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H07234200-A |
| titleOfInvention | Plate metal electrode for modified electrode and method for manufacturing the same |
| abstract | (57) [Abstract] [Purpose] In a flat plate metal electrode for a modified electrode used as an electrochemical sensor or a reactor, a metal electrode for improving the adhesion of a functional film adhered on the metal electrode and improving the sensitivity. The objective is to secure the surface area and increase the number of steps without increasing the number of steps. A metal or metal silicide having a shape of a porous film that is aggregated as a metal electrode 1 ', or a metal or metal silicide continuous film whose surface characteristics are electrochemically suitable for a chemical sensor or a reactor on the porous film. It is a flat plate metal electrode for a modified electrode, characterized in that it is a two-layer film covered with and the metal electrode 1 ′ is covered with the functional film 2. When a silicon substrate is used as the substrate, it is possible to obtain the desired structure by using the silicidation reaction between the metal deposited on the substrate and silicon. |
| priorityDate | 1994-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 246.