| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
1994-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02d667db1529520651f8a0a67ea31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8dedc2524558d8759282b9fa8387e591
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21747acfb77b0d181ab4dff0d66658d4 |
| publicationDate |
1995-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H07201764-A |
| titleOfInvention |
Plasma gas phase reaction method |
| abstract |
(57) [Summary] [Objective] The film thickness of the substrate surface formed by plasma vapor phase reaction is made uniform. [Configuration] The reaction space is depressurized and a reactive gas is supplied. In addition, by applying power to the plurality of electrodes provided in the reaction space, A Lissajous waveform is drawn parallel to the processed surface of the substrate. The Lissajous waveform makes the plasma treatment of the substrate surface uniform. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103806093-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103806093-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103938272-A |
| priorityDate |
1994-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |