| abstract |
(57) [Summary] [Structure] (A) An aromatic polyimide precursor having a repeating unit represented by the general formula (I) and having an amide bond concentration of 1.5 mol / kg or more; A photosensitive composition comprising a photopolymerization initiator and (C) a solvent, wherein X and / or Y is a specific group. [Effects] The photosensitive composition of the present invention is suitable for forming a polyimide pattern by image formation using a short-wavelength light source which will become the mainstream in the semiconductor manufacturing process in the future. |