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publicationDate 1994-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06266112-A
titleOfInvention Improved photoresist composition
abstract (57) Summary An object of the present invention is to improve a chemically sensitized photoresist composition. The photoresist composition of the present invention comprises (i) a photosensitive acid generator and (ii) a polymer, which comprises (a) hydroxystyrene and (i) acrylate, methacrylate, or acrylate and methacrylate. And the above polymer containing a reaction product with the mixture. According to the present invention, a photoresist composition having improved thermal stability and less susceptible to contaminants in the air can be obtained.
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