abstract |
(57) Summary An object of the present invention is to improve a chemically sensitized photoresist composition. The photoresist composition of the present invention comprises (i) a photosensitive acid generator and (ii) a polymer, which comprises (a) hydroxystyrene and (i) acrylate, methacrylate, or acrylate and methacrylate. And the above polymer containing a reaction product with the mixture. According to the present invention, a photoresist composition having improved thermal stability and less susceptible to contaminants in the air can be obtained. |