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filingDate 1994-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2ccb7e076016653b95b4b98695f4c35
publicationDate 1994-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06256292-A
titleOfInvention Photochemically generating acid compound for photoresist
abstract (57) [Summary]n[Purpose] To develop a new compound that generates an acid during radiolysis provide.n[Structure] Diazoquinone sulfonyl ester having the following formula Le.n[Chemical 1]n (In the formula, R is hydrogen, hydroxyl, or -O-S (= O) 2 -Q part Minutes, R 1 Is CH 2 OS (= O) 2 -Q or -NO 2 And R 2 Is CH 2 OS (= O) 2 -Q or -NO 2 And R 3 Is lower alkyl or Hydrogen, R Four Is hydrogen, CH 2 OS (= O) 2 -Q or -NO 2 And R Five Is hydrogen, CH 2 OS (= O) 2 -Q or -NO 2 And Q is di Azonaphthoquinone part, but R 2 And R Four Is NO 2 If R 3 Is lower alkyl, R 1 And R 2 Is Not identical and R Four And R Five Are not the same)
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06301201-A
priorityDate 1993-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 32.