http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06163473-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 |
| filingDate | 1992-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8b7ab94d6c8953a66a9133f203ebac0 |
| publicationDate | 1994-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06163473-A |
| titleOfInvention | Dry etching method |
| abstract | (57) [Abstract] [Purpose] Highly selective and anisotropic etching of W-polycide film is performed without using CFC (chlorofluorocarbon) gas. [Structure] The W-polycide film 5 is formed of CO / SF 6 / HBr. Etching is performed using a mixed gas. WSi x by F * While the rapid etching of the layer 4 and the high selective etching of the polycrystalline silicon layer 3 by Br * proceed, the CBr x polymer derived from the decomposition product of the resist mask 6 becomes CO. Incorporating C—O bonds, carbonyl groups and the like derived from the above, the side wall protective film 7 having a strong film quality is formed. Therefore, the incident ion energy and the deposition amount of the carbon-based polymer necessary for anisotropic processing can be reduced, the selectivity with respect to the resist mask 6 and the gate oxide film 2 can be improved, and particle contamination can be suppressed. If S 2 Br 2 is added to the gas and the deposition of S (sulfur) is also used, the selectivity is further improved and the pollution is reduced. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09306895-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9287495-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100390815-B1 |
| priorityDate | 1992-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.