abstract |
(57) [Summary] [Object] To provide a method that significantly reduces multiple interference of light, which is an obstacle to fine patterning, improves the manufacturing yield, and forms finer patterns. [Structure] When a pattern is formed by photolithography, an antireflection film is formed on the surface of a photoresist and exposed, and an amorphous fluorine-containing polymer is used as the antireflection film material. |