http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0574700-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1991-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d02204442ed82de27a321316a52a27cb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16370008e9631046249bae7afe40d7ee
publicationDate 1993-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0574700-A
titleOfInvention Pattern formation method
abstract (57) [Summary] [Object] To provide a method that significantly reduces multiple interference of light, which is an obstacle to fine patterning, improves the manufacturing yield, and forms finer patterns. [Structure] When a pattern is formed by photolithography, an antireflection film is formed on the surface of a photoresist and exposed, and an amorphous fluorine-containing polymer is used as the antireflection film material.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7569323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7771913-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6136505-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7759047-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7642034-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7666572-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100922782-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7670750-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8088537-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7354693-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7455952-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5830623-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8323872-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7365115-B2
priorityDate 1991-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11029757
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9387
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415862236
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457280508
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415767689
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419573697
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415881809
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407325781
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419609401
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID22283742
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID79130
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419514653
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419521495
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419518568
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID169957
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559562
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419595990
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID78976
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9397
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8302
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID221523

Total number of triples: 51.