http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0562957-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1991-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be7bef19c5bf160d1bc783729dd65b50 |
| publicationDate | 1993-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0562957-A |
| titleOfInvention | Plasma cleaning method |
| abstract | (57) [Summary] [Purpose] To provide a new plasma cleaning method that is safe, does not recontaminate even after long-term cleaning, and can sufficiently clean heavy metal contamination. Concerning a plasma cleaning method, (1) converting a mixed gas of argon gas or helium gas and hydrogen gas into plasma, and exposing the semiconductor substrate to the plasma gas; And (2) converting a halogen gas or a mixed gas of a halogen compound gas and an oxygen gas into plasma, and exposing the semiconductor substrate to the plasma gas. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014196606-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005310828-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100670618-B1 |
| priorityDate | 1991-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.