http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05291129-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1992-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4b30fe81589058e6ed87df3cda14236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58c38f2813ee5b91bbd2c7b666a0d55c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b13ddbaffb58f66b1ed6ebd8c4e76cb7 |
| publicationDate | 1993-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05291129-A |
| titleOfInvention | Plasma ashing method |
| abstract | (57) [Abstract] [Purpose] The ratio of oxygen ions to oxygen radicals (O 2 + / As a means for adjusting O * ), the degree of vacuum in the chamber of the downstream type apparatus is adjusted and ashing is performed. [Structure] The wafer W is set on the stage 7 and the opening 2 is formed. Closed, the chamber 3 is depressurized, a reaction gas is introduced from the inlet 9 into the chamber 3, and a high frequency is applied to the electrode 4, plasma is generated between the electrodes 4 and 5, and oxygen activated by the plasma is generated. Radicals (O * ) fall onto the surface of the wafer W, and at the same time, the suction passage 1 Oxygen ions (O 2 + ) are also supplied to the surface of the wafer W by suction from 0, and the resist film formed on the surface of the wafer W is decomposed and removed by the assistance of the oxygen ions (O 2 + ). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011027773-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6043004-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9006164-B2 |
| priorityDate | 1992-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.