http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0525277-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-02 |
| filingDate | 1991-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eb9187837867c9c08b7a2db9ce85446 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad60b78d1616f3cba147e2333490c4a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99bdff9aa47d25894f4e6e415f25ea71 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a516ae9fc851cb721fa338e11f3c36af |
| publicationDate | 1993-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0525277-A |
| titleOfInvention | Resist composition and method for producing organic silicon polymer |
| abstract | (57) [Summary] (Modified) [Object] To provide a negative resist excellent in sensitivity and resolution with respect to an upper layer resist for a two-layer structure, and a method for producing an organic silicon polymer constituting the negative resist. [Constitution] The main component of the resist composition is composed of the general formula (1) As a method for producing an organic silicon polymer represented by, a polymer obtained by hydrolyzing an organic silicon compound represented by the general formula (2) and dehydration polycondensation is represented by the following general formula (3), (4), (5): To react with any one of the organic silicon compounds, the hydroxyl group of the polymer is represented by the following general formula (6) Substituted with a triorganosilyl group represented by, or at least one of the silicon compounds represented by the general formula (3), (4), (5) is dissolved in an organic solvent, and the solution is added in the presence of water. Then, the organic silicon compound of the general formula (2) is gradually added to cause dehydration polycondensation, and the hydroxyl group contained in the organic silicon compound is converted to the general formula (6). To the triorganosilyl group of. (Si 2 R 1 O 3 ) m (R 2 3 SiO 1/2 ) n ・ ・ ・ ・ ・ ・ (1) X 3 SiR 1 SiX 3 ・ ・ ・ ・ ・ ・ ・ ・ (2) R 2 3 SiX ・・ ・ ・ ・ ・ ・ ・ (3) R 2 3 Si-NH-SiR 2 3 ・ ・ ・ ・ ・ ・ ・ ・ (4) R 2 3 Si-O-SiR 2 3 ・ ・ ・ ・ ・ ・ ・ ・ ( 5) R 2 3 Si -... (6) Here, X represents a halogen group, an alkoxy group, a cyano group, an isocyanato group or an isocyanato group, R 1 represents an alkylene, and R 2 Represents a monovalent hydrocarbon group and may be the same or different. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007016177-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009177198-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8124239-B2 |
| priorityDate | 1991-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.