Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
1992-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4350b776af813e4e8cd4b8fee69bd775 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51564c79121b388d009747c2e6d77c6b |
publicationDate |
1993-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-H05204161-A |
titleOfInvention |
Photoimageable film from hydrogen silsesquioxane resin |
abstract |
(57) [Summary] [Purpose] From hydrogen silsesquioxane resin, Provided is a method for forming a film having excellent resolution, thermal stability and etching resistance. A ceramic precursor coating containing a hydrogensilsesquioxane resin and an initiator is formed on a substrate and then selected areas of the coating are irradiated for a time sufficient to cure the resin. The uncured portion of the coating is then washed away, leaving the patterned coating. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006073115-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5177129-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007076950-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008105503-A1 |
priorityDate |
1991-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |