http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05160084-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 1991-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2747f954783c72e65fd4a88c95573760 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f71cc65e68437f48693295f7ab4a4a8b |
| publicationDate | 1993-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05160084-A |
| titleOfInvention | Method for manufacturing semiconductor device |
| abstract | (57) [Summary] [Objective] Regarding post-treatment after contact hole formation, the purpose is to completely remove alumina deposits after contact etching and obtain good contact. [Structure] 1) An etching step of forming a contact hole in an insulating film deposited on a substrate to be processed, and then carbon tetrabromide (CBr 4 ) or boron trichloride (BCl 3 ) or carbon tetrachloride (CCl 4). 4 ) or a post-treatment step of dry-etching the substrate to be treated using plasma of a gas containing boron tribromide (BBr 3 ), 2) a gas containing the above-mentioned gas and a fluorine-based gas in the post-treatment step. 3) Using mixed gas, dry etching is performed using the above-mentioned gas in the post-treatment step, and then a fluorine-based gas is used. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07230993-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7364956-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005026687-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100748477-B1 |
| priorityDate | 1991-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.