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filingDate 1991-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d9b2c657267df28f97723e96a48ddb9
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publicationDate 1993-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H05102092-A
titleOfInvention Plasma processing method
abstract (57) [Summary] [Object] The present invention relates to a plasma processing method, and an object of the present invention is to realize a plasma processing method using hydrogen that accelerates the processing of hydrogen atoms and hydrogen ions. [Configuration] A first gas containing hydrogen molecules as a main component and the first gas A second gas containing hydrogen in an amount less than that of the first gas, and a first step of supplying the second gas into the chamber (8); Second step of performing plasma treatment on the workpiece surface (1) by generating plasma of a mixed gas consisting of the above gases in the chamber (8), and the second gas contains hydrogen and oxygen. It is composed of an organic compound or an inorganic compound containing hydrogen.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180021156-A
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priorityDate 1990-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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