| abstract |
PURPOSE: To surely treat waste gas to remove harmful matter and to prevent discharge of harmful matter by bringing the waste gas contg. chlorine fluoride into contact with solid alkali and an adsorbent. n CONSTITUTION: The waste gas to be treated contains chlorine fluoride gas which is used to clean off scales produced by CVD, PVD, etc., in the production process of semiconductors, etc. This waste gas is brought into contact with solid alkali such as soda lime, potassium hydroxide, etc., and with activated carbon and an adsorbent such as zeolite. By this method, most of the harmful gas such as chlorine fluoride can be fixed to the alkali reagent, and a trace amt. of chlorine which does not treated in the first treatment can completely be removed with using a little amt. of adsorbent, and thereby, discharge of harmful matter is prevented. n COPYRIGHT: (C)1992,JPO&Japio |