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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1990-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1992-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0413149-A
titleOfInvention Photosensitive composition
abstract PURPOSE: To shorten exposure time to restrain occurrence of fogging due to a fluorescent lamp, to enhance contrast, and to prevent occurrence of unsharpening due to printing by incorporating an amphoteric surfactant in a polymerizable compound. n CONSTITUTION: The amphoteric surfactant, such as betaine type, sulfobetaine type, sulfate-betaine type, or imidazolinium betaine type compounds, and alkylaminocarboxylic acid, is incorporated in a positive type photosensitive composition containing an o-naphthoquinondiazide-disulfonate ester and a novolak resin, thus permitting the exposure time to be shortened, occurrence of fogging due to the fluorescent lamp to be restrained, contrast to be enhanced, and occurrence of unsharpening due to printing to be prevented. n COPYRIGHT: (C)1992,JPO&Japio
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