| abstract |
PURPOSE: To enhance sensitivity to deep ultraviolet rays and dry etching resistance and to form a fine pattern with a good cross section by incorporating an alkali-soluble polymer having a phenol structure and a specified heterocyclic compound. n CONSTITUTION: This photosensitive composition contains the alkali-soluble polymer having the phenol structure and the heterocyclic compound represented by formula I or II in which Z 1 is a nonmetallic atomic group necessary to form an N-containing hetero ring, and each of R 1 and R 2 is H, 1 - 20 C alkyl, or the like, thus permitting the obtained photosensitive composition to be high in sensitivity to radiation short in wavelength, such as deep ultraviolet rays, and superior in dry etching resistance, and to form a fine pattern having a good cross section. n COPYRIGHT: (C)1991,JPO&Japio |