| abstract |
A novel method and substrate comprising an antireflective composition comprising one or more thermal acid generators. A) a substrate including 1) a resin and 2) a structure of formula (I) [Wherein Y has the structure of formula (II); (Each R1 is independently CN, NO2, F, Cl, Br, I, or CF3, n is an integer of 1 to 5, and X is an anionic component)] a thermal acid generator. Applying a layer of a coating composition comprising: b) applying a layer of a photoresist composition on the coating composition layer; and a method for forming a photoresist relief image. [Selection figure] None |