| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02076
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-362
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0275 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-351
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-301 |
| filingDate |
2018-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2022-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-7181899-B2 |
| titleOfInvention |
Light Absorbing Mask for Hybrid Laser Scribing and Plasma Etching Wafer Singulation Process |
| priorityDate |
2017-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |