http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6165943-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L57-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-00 |
| filingDate | 2016-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-6165943-B1 |
| titleOfInvention | Resist composition |
| abstract | Provided is a resist composition that has excellent plating solution resistance during electroless plating and has excellent releasability with respect to a resist stripping solution during peeling. A resist composition comprising an acrylic resin and a coumarone resin, wherein a content of the acrylic resin in a total of 100% by mass of the acrylic resin and the coumarone resin is 30% by mass or more and 90% by mass or less. The content of the coumarone resin is 10% by mass or more and 70% by mass or less, the acid value of the acrylic resin is 50 mgKOH / g or more and 140 mgKOH / g or less, and the hydroxyl value of the coumarone resin is 20 mgKOH / g or less. Resist composition. [Selection figure] None |
| priorityDate | 2016-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.