| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 |
| filingDate |
2016-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-6141500-B2 |
| titleOfInvention |
Substrate pretreatment to reduce filling time in nanoimprint lithography |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11709430-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170625-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11592741-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170466-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170624-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7086841-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018533839-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017170684-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7094878-B2 |
| priorityDate |
2015-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |