| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01006 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate |
2015-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-6055879-B1 |
| titleOfInvention |
Semiconductor device manufacturing method, substrate processing apparatus, and program |
| abstract |
The controllability of the composition ratio of a film formed on a substrate is improved. A step of supplying a raw material containing a predetermined element to a substrate, a step of supplying a first reactant containing nitrogen and carbon to the substrate, and a second reactant containing nitrogen to the substrate are provided. A step of forming a film on the substrate by performing a cycle including a step of supplying and a step of supplying a third reactant containing oxygen to the substrate a predetermined number of times. The supply amount of the reactant is made smaller than the supply amount of the first reactant. [Selection] Figure 1 |
| priorityDate |
2015-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |