| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32036 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2010-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5826746-B2 |
| titleOfInvention |
Atomic layer etching using pulsed plasma |
| priorityDate |
2009-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |