| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3438 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-855 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-855
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| filingDate |
2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-5730943-B2 |
| titleOfInvention |
System and method for double-sided sputter etching of substrates |
| priorityDate |
2007-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |