http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5421527-B2
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2007-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-5421527-B2 |
| titleOfInvention | Photomask plasma etching method and apparatus |
| priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.